Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US14504191Application Date: 2014-10-01
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Publication No.: US09182679B2Publication Date: 2015-11-10
- Inventor: Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
- Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
- Applicant Address: NL Veldhoven DE Oberkochen
- Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- Current Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- Current Assignee Address: NL Veldhoven DE Oberkochen
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03256809 20031028
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20
Abstract:
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
Public/Granted literature
- US20150015858A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-01-15
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