Invention Grant
- Patent Title: Selectable coulomb aperture in E-beam system
- Patent Title (中): 电子束系统中可选的库仑孔径
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Application No.: US13012710Application Date: 2011-01-24
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Publication No.: US09184024B2Publication Date: 2015-11-10
- Inventor: Zhongwei Chen
- Applicant: Zhongwei Chen
- Applicant Address: TW Hsinchu
- Assignee: HERMES-MICROVISION, INC.
- Current Assignee: HERMES-MICROVISION, INC.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Agent Justin King
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/15 ; H01J37/28

Abstract:
A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens.
Public/Granted literature
- US20110192975A1 SELECTABLE COULOMB APERTURE IN E-BEAM SYSTEM Public/Granted day:2011-08-11
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