An apparatus for storing a substrate on which a pattern is formed includes a main body storing the substrate, a first pad located at the bottom of the main body and including a first groove supporting one edge of the substrate, a second pad neighboring the first pad and including a second groove supporting the center of the substrate, and a third pad spaced from the first pad, the second pad being disposed between the first and third pads, the third pad including a third groove supporting the other edge of the substrate.