Invention Grant
- Patent Title: Memory devices and methods of manufacturing the same
- Patent Title (中): 存储器件及其制造方法
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Application No.: US14315610Application Date: 2014-06-26
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Publication No.: US09184376B2Publication Date: 2015-11-10
- Inventor: Sang Hwan Park , Soonoh Park , Sangyong Kim , Joonmyoung Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2013-0152430 20131209
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/08

Abstract:
A magnetic memory device may include a substrate and a magnetic tunnel junction memory element on the substrate. The magnetic tunnel junction memory element may include a reference magnetic layer, a tunnel barrier layer, and a free magnetic layer. The reference magnetic layer may include a first pinned layer, an exchange coupling layer, and a second pinned layer. The exchange coupling layer may be between the first and second pinned layers, and the second pinned layer may include a ferromagnetic layer and a non-magnetic layer. The second pinned layer may be between the first pinned layer and the tunnel barrier layer, and the tunnel barrier layer may be between the reference magnetic layer and the free magnetic layer.
Public/Granted literature
- US20150162525A1 MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2015-06-11
Information query
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