发明授权
- 专利标题: Dynamic electrode plasma system
- 专利标题(中): 动态电极等离子体系统
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申请号: US14020793申请日: 2013-09-07
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公开(公告)号: US09190248B2公开(公告)日: 2015-11-17
- 发明人: James P. Buonodono
- 申请人: Varian Semiconductor Equipment Associates, Inc.
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; H01L21/306 ; H01J37/32
摘要:
A system for processing a substrate includes a plasma chamber to generate a plasma therein. The system also includes a process chamber to house the substrate, where the process chamber is adjacent the plasma chamber. The system also includes a rotatable extraction electrode disposed between the plasma chamber and substrate, where the rotatable extraction electrode is configured to extract an ion beam from the plasma, and configured to scan the ion beam over the substrate without movement of the substrate by rotation about an extraction electrode axis.
公开/授权文献
- US20150069017A1 DYNAMIC ELECTRODE PLASMA SYSTEM 公开/授权日:2015-03-12