Invention Grant
- Patent Title: Apparatus and method for inspecting crystallization
- Patent Title (中): 检查结晶的装置和方法
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Application No.: US13922075Application Date: 2013-06-19
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Publication No.: US09194815B2Publication Date: 2015-11-24
- Inventor: Byoung-Kwon Choo , Cheol-Ho Park , Hee-Geun Son , Do-Yeob Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Christie, Parker & Hale, LLP
- Priority: KR10-2013-0014978 20130212
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/956

Abstract:
An apparatus for inspecting crystallization includes a substrate including a semiconductor layer, the semiconductor layer includes a plurality of crystallized regions separated from each other; a stage configured to change a position of the substrate, the substrate being seated thereon; a photographing unit configured to acquire image data regarding the semiconductor layer; an inspection unit configured to obtain inspection data regarding the semiconductor layer; and a control unit configured to output change data regarding a change in the position of the substrate according to the image data acquired by the photographing unit.
Public/Granted literature
- US20140226155A1 APPARATUS AND METHOD FOR INSPECTING CRYSTALLIZATION Public/Granted day:2014-08-14
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