Invention Grant
- Patent Title: Exposure-suppressing imaging system
- Patent Title (中): 曝光抑制成像系统
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Application No.: US14099777Application Date: 2013-12-06
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Publication No.: US09197819B2Publication Date: 2015-11-24
- Inventor: Chao-Wen Liang , Jhe-Syuan Lin , Min-Fang Lo
- Applicant: Chung-Shan Institute of Science and Technology, Armaments Bureau, M.N.D
- Applicant Address: TW Taoyuan
- Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: TW Taoyuan
- Agent Chun-Ming Shih
- Main IPC: G02B26/00
- IPC: G02B26/00 ; G02F1/03 ; G02F1/153 ; G02F1/29 ; H04N5/235 ; H04N5/217 ; G02B13/22

Abstract:
An exposure-suppressing imaging system has a first optical assembly forming a first image of an object on a focal plane thereof, a beam splitter positioned between the first optical assembly and the focal plane of the first optical assembly; an LCOS reflective light modulator positioned on the focal plane, and selectively and partially altering the reflectivity thereof to reflect the first image back to the beam splitter; a second optical assembly positioned on a side of the beam splitter and receiving the reflected first image to form a second image on a focal plane of the second optical assembly; a light sensor converting the second image into a signal; and a controller receiving the signal computed as a third image, and selectively controlling the reflectivity of the LCOS reflective light modulator according to whether the signal contains information of overexposure on the third image.
Public/Granted literature
- US20150163389A1 EXPOSURE-SUPPRESSING IMAGING SYSTEM Public/Granted day:2015-06-11
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