Invention Grant
US09202571B2 Vertically-integrated nonvolatile memory devices having laterally-integrated ground select transistors
有权
具有横向集成的地选择晶体管的垂直集成的非易失性存储器件
- Patent Title: Vertically-integrated nonvolatile memory devices having laterally-integrated ground select transistors
- Patent Title (中): 具有横向集成的地选择晶体管的垂直集成的非易失性存储器件
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Application No.: US14272765Application Date: 2014-05-08
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Publication No.: US09202571B2Publication Date: 2015-12-01
- Inventor: Sunil Shim , Jaehun Jeong , Jaehoon Jang , Kihyun Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2010-0083682 20100827
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/04 ; H01L27/115

Abstract:
Nonvolatile memory devices utilize vertically-stacked strings of nonvolatile memory cells (e.g., NAND-type strings) that can be selectively coupled to common source lines within a substrate. This selective coupling may be provided by lateral ground select transistors having different threshold voltages that account for different lateral spacings between the vertically-stacked strings of nonvolatile memory cells and the common source lines.
Public/Granted literature
- US20140241065A1 Vertically-Integrated Nonvolatile Memory Devices Having Laterally-Integrated Ground Select Transistors Public/Granted day:2014-08-28
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