发明授权
- 专利标题: Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen
- 专利标题(中): 用于电子显微镜,电子显微镜,电子显微镜和观察样品生产装置的观察标本
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申请号: US14354917申请日: 2012-10-16
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公开(公告)号: US09202668B2公开(公告)日: 2015-12-01
- 发明人: Takafumi Miwa , Yoichi Ose , Eiko Nakazawa , Mami Konomi , Shunya Watanabe , Yoshinobu Kimura , Natsuki Tsuno
- 申请人: Hitachi High-Technologies Corporation
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge PC
- 优先权: JP2011-241040 20111102
- 国际申请: PCT/JP2012/076704 WO 20121016
- 国际公布: WO2013/065475 WO 20130510
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; H01J37/26 ; G01B15/02 ; H01J37/28 ; H01J37/02
摘要:
The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.
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