发明授权
- 专利标题: Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head
- 专利标题(中): 排液头,排液头,具有排液头的排液装置以及排液头的制造装置的制造方法
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申请号: US13727758申请日: 2012-12-27
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公开(公告)号: US09202717B2公开(公告)日: 2015-12-01
- 发明人: Atsushi Takeuchi , Osamu Machida , Akira Shimofuku , Xianfeng Chen , Ryo Tashiro
- 申请人: Atsushi Takeuchi , Osamu Machida , Akira Shimofuku , Xianfeng Chen , Ryo Tashiro
- 申请人地址: JP Tokyo
- 专利权人: RICOH COMPANY, LTD.
- 当前专利权人: RICOH COMPANY, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Cooper & Dunham LLP
- 优先权: JP2011-290291 20111229; JP2012-276506 20121219
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; B05C11/00 ; B05C13/00 ; B05C13/02 ; B05B7/00 ; H01L21/62 ; B41J2/01 ; B41J2/16
摘要:
A method of making a liquid discharge head which includes a nozzle to discharge liquid, a pressure chamber communicating with the nozzle, a pressure chamber substrate to form surfaces of the pressure chamber, and a piezoelectric actuator to apply pressure to liquid in the pressure chamber having a lower electrode, a ferroelectric film, and an upper electrode, includes a silicon wafer supplying process, a position adjustment process, a surface treatment process to reform a surface of the lower electrode, a liquid applying process to apply ferroelectric precursor on the lower electrode by an inkjet method, a heating process to heat the ferroelectric precursor film, and a cooling process. A series of processes from the position adjustment process to the cooling process is iterated to form a ferroelectric film having a predetermined thickness. The series of processes is performed with certain waiting times inserted between key processes.
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