发明授权
- 专利标题: Group III nitride semiconductor light-emitting device and method for producing the same
- 专利标题(中): III族氮化物半导体发光器件及其制造方法
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申请号: US14197057申请日: 2014-03-04
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公开(公告)号: US09202976B2公开(公告)日: 2015-12-01
- 发明人: Koji Okuno , Yohei Samura
- 申请人: TOYODA GOSEI CO., LTD.
- 申请人地址: JP Kiyosu-Shi, Aichi-Ken
- 专利权人: TOYODA GOSEI CO., LTD.
- 当前专利权人: TOYODA GOSEI CO., LTD.
- 当前专利权人地址: JP Kiyosu-Shi, Aichi-Ken
- 代理机构: McGinn IP Law Group, PLLC.
- 优先权: JP2013-049264 20130312
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/22 ; H01L21/02
摘要:
The present invention provides a Group III nitride semiconductor light-emitting device in which a flat semiconductor layer is grown on a sapphire substrate provided with an uneven shape, and a method for producing the same. When the area ratio R of the flat surface area S on the main surface to the total area K of the sapphire substrate is 0.1 or more to less than 0.5, in formation of the semiconductor layer on the sapphire substrate having an uneven shape on the main surface thereof, at least two types of gases: a raw material gas containing a Group III element and a raw material gas containing Group V element are supplied so as to satisfy the equation 1,000≦Y/(2×R)≦1,200. In the equation, Y is the partial pressure ratio of the raw material gas containing Group V element to the raw material gas containing Group III element.
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