发明授权
US09207548B2 Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method
有权
具有碎片缓解系统的辐射源,具有碎片缓解系统的光刻设备,用于防止碎屑沉积在集光镜上的方法和装置制造方法
- 专利标题: Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method
- 专利标题(中): 具有碎片缓解系统的辐射源,具有碎片缓解系统的光刻设备,用于防止碎屑沉积在集光镜上的方法和装置制造方法
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申请号: US13058776申请日: 2009-07-30
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公开(公告)号: US09207548B2公开(公告)日: 2015-12-08
- 发明人: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- 申请人: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2009/005509 WO 20090730
- 国际公布: WO2010/017892 WO 20100218
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H05G2/00
摘要:
A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.