Invention Grant
- Patent Title: Electron beam apparatus for visualizing a displacement of an electric field
- Patent Title (中): 用于可视化电场位移的电子束装置
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Application No.: US13817086Application Date: 2011-07-07
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Publication No.: US09208994B2Publication Date: 2015-12-08
- Inventor: Takashi Ohshima , Michio Hatano , Hideo Morishita
- Applicant: Takashi Ohshima , Michio Hatano , Hideo Morishita
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-182755 20100818
- International Application: PCT/JP2011/065547 WO 20110707
- International Announcement: WO2012/023354 WO 20120223
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J37/26 ; H01J37/28

Abstract:
The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
Public/Granted literature
- US20130146766A1 Electron Beam Apparatus Public/Granted day:2013-06-13
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