发明授权
- 专利标题: Thin film transistor, method for manufacturing the same, and semiconductor device
- 专利标题(中): 薄膜晶体管,其制造方法以及半导体器件
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申请号: US14626150申请日: 2015-02-19
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公开(公告)号: US09209283B2公开(公告)日: 2015-12-08
- 发明人: Toshikazu Kondo , Hideyuki Kishida
- 申请人: Semiconductor Energy Laboratory Co., Ltd.
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2009-037912 20090220
- 主分类号: H01L29/00
- IPC分类号: H01L29/00 ; H01L29/66 ; H01L27/12 ; H01L29/45 ; H01L29/786 ; H01L29/24 ; H01L29/49 ; H01L21/477 ; H01L21/02
摘要:
In a thin film transistor, an increase in off current or negative shift of the threshold voltage is prevented. In the thin film transistor, a buffer layer is provided between an oxide semiconductor layer and each of a source electrode layer and a drain electrode layer. The buffer layer includes a metal oxide layer which is an insulator or a semiconductor over a middle portion of the oxide semiconductor layer. The metal oxide layer functions as a protective layer for suppressing incorporation of impurities into the oxide semiconductor layer. Therefore, in the thin film transistor, an increase in off current or negative shift of the threshold voltage can be prevented.
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