发明授权
- 专利标题： Method for producing pattern phase difference film, pattern phase difference film, and image display device
- 专利标题（中）： 图案相位差片，图案相位差膜和图像显示装置的制造方法
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申请号： US14236460申请日： 2012-08-29
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公开(公告)号： US09217925B2公开(公告)日： 2015-12-22
- 发明人: Hiroyuki Nishimura , Yoshihide Nakao , Tomoya Kawashima , Kazuki Yamada , Keiji Kashima
- 申请人： Hiroyuki Nishimura , Yoshihide Nakao , Tomoya Kawashima , Kazuki Yamada , Keiji Kashima
- 申请人地址： JP Tokyo
- 专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2011-188384 20110831
- 国际申请： PCT/JP2012/071783 WO 20120829
- 国际公布： WO2013/031802 WO 20130307
- 主分类号： B32B3/00
- IPC分类号： B32B3/00 ; G03F7/20 ; G02B5/30 ; H04N13/04 ; G02F1/13363
摘要：
A pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. A mask, which has slits that are made narrow compared to the width of a region that is to undergo exposure treatment and are provided for exposure treatment, is manufactured.
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