发明授权
- 专利标题： Interferometric measurement of rotation of stage apparatus and adjustment method thereof, exposure apparatus and method of manufacturing device
- 专利标题（中）： 舞台装置的旋转干涉测量及其调节方法，曝光装置及制造装置的方法
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申请号： US14065681申请日： 2013-10-29
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公开(公告)号： US09217937B2公开(公告)日： 2015-12-22
- 发明人: Zenichi Hamaya , Keiji Emoto , Ryo Takai , Shinichiro Hirai
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Rossi, Kimms & McDowell LLP
- 优先权： JP2012-246663 20121108
- 主分类号： G01B9/02
- IPC分类号： G01B9/02 ; G03F9/00
摘要：
A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
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