发明授权
US09218562B2 Method for producing a contactless microcircuit 有权
无接触微电路的制造方法

  • 专利标题: Method for producing a contactless microcircuit
  • 专利标题(中): 无接触微电路的制造方法
  • 申请号: US14412491
    申请日: 2013-05-03
  • 公开(公告)号: US09218562B2
    公开(公告)日: 2015-12-22
  • 发明人: Ghislain BoironPierre Pic
  • 申请人: INSIDE SECURE
  • 申请人地址: FR Aix-en-Provence
  • 专利权人: INSIDE SECURE
  • 当前专利权人: INSIDE SECURE
  • 当前专利权人地址: FR Aix-en-Provence
  • 代理机构: Oliff PLC
  • 优先权: FR1201866 20120702
  • 国际申请: PCT/FR2013/050982 WO 20130503
  • 国际公布: WO2014/006286 WO 20140109
  • 主分类号: G06K19/06
  • IPC分类号: G06K19/06 G06K19/077
Method for producing a contactless microcircuit
摘要:
The invention relates to a method for manufacturing a contactless microcircuit antenna coil, including steps of: depositing a first electrically conducting layer on a first face of a wafer, and forming in the first layer an antenna coil in a spiral having several turns, including an internal turn coupled to an internal contact pad and an external turn coupled to an external contact pad, the external turn following the entire contour of antenna coil except for a zone through which a conducting path coupling the external contact pad to the external turn can pass, the external and internal contact pads of the antenna coil being formed in a central zone of the external turn, the antenna coil having a bypass zone in which each turn bypasses the external contact pad.
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