Invention Grant
US09218951B2 Plasma lighting system with light sensor for control based on intensity
有权
等离子照明系统,具有光传感器,可根据强度进行控制
- Patent Title: Plasma lighting system with light sensor for control based on intensity
- Patent Title (中): 等离子照明系统,具有光传感器,可根据强度进行控制
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Application No.: US14335667Application Date: 2014-07-18
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Publication No.: US09218951B2Publication Date: 2015-12-22
- Inventor: Donghun Kim , Junsung Kim , Byeongju Park
- Applicant: LG Electronics Inc.
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2014-0009484 20140127
- Main IPC: H01J65/04
- IPC: H01J65/04 ; H01J61/52 ; H05B41/392

Abstract:
A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb filled with a main dose and an additive dose. The main dose and the additive dose generate light under the influence of microwaves and have the maximum intensities of respective intrinsic wavelengths at different wavelengths. A waveguide is configured to guide the microwaves generated by the magnetron to the bulb. A motor is configured to rotate the bulb. A sensor is configured to sense the intensity of light having a specific wavelength emitted from the bulb. A controller is connected to the motor. The controller adjusts the Revolutions Per Minute (RPM) of the bulb based on the intensity of light having the specific wavelength sensed by the sensor. With this arrangement, a Color Rendering Index (CRI) of the plasma lighting system may be adjusted during operation.
Public/Granted literature
- US20150214022A1 PLASMA LIGHTING SYSTEM Public/Granted day:2015-07-30
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