Invention Grant
- Patent Title: Semiconductor devices having a nanowire channel structure
- Patent Title (中): 具有纳米线通道结构的半导体器件
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Application No.: US14163148Application Date: 2014-01-24
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Publication No.: US09219064B2Publication Date: 2015-12-22
- Inventor: Sang-Su Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0008718 20130125
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L21/8234 ; H01L21/8238

Abstract:
A semiconductor device includes a first transistor and a second transistor. The first transistor includes a first nanowire extending through a first gate electrode and between first source and drain regions. The second transistor includes a second nanowire extending through a second gate electrode and between a second source and drain regions. The first nanowire has a first size in a first direction and a second size in a second direction, and the second nanowire has a second size in the first direction and substantially the second size in the second direction. The first nanowire has a first on current and the second nanowire has a second on current. The on current of the first nanowire may be substantially equal to the on current of the second nanowire based on a difference between the sizes of the first and second nanowires. In another arrangement, the on currents may be different.
Public/Granted literature
- US20140210013A1 SEMICONDUCTOR DEVICES HAVING A NANOWIRE CHANNEL STRUCTURE Public/Granted day:2014-07-31
Information query
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