Invention Grant
- Patent Title: Artificial electromagnetic material
- Patent Title (中): 人造电磁材料
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Application No.: US13583881Application Date: 2011-10-27
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Publication No.: US09219314B2Publication Date: 2015-12-22
- Inventor: Ruopeng Liu , Lin Luan , Chaofeng Kou
- Applicant: Ruopeng Liu , Lin Luan , Chaofeng Kou
- Applicant Address: CN Shenzhen CN Shenzhen
- Assignee: KUANG-CHI INNOVATIVE TECHNOLOGY LTD.,KUANG-CHI INSTITUTE OF ADVANCED TECHNOLOGY
- Current Assignee: KUANG-CHI INNOVATIVE TECHNOLOGY LTD.,KUANG-CHI INSTITUTE OF ADVANCED TECHNOLOGY
- Current Assignee Address: CN Shenzhen CN Shenzhen
- Agency: Leason Ellis LLP.
- Priority: CN201110179776 20110629; CN201110179837 20110629; CN201110179888 20110629
- International Application: PCT/CN2011/081408 WO 20111027
- International Announcement: WO2013/000223 WO 20130103
- Main IPC: H01Q15/00
- IPC: H01Q15/00 ; H01Q15/02

Abstract:
An artificial electromagnetic material includes at least one material sheet. Each material sheet includes a substrate and a plurality of artificial microstructures attached to the substrate. Each substrate is virtually divided into multiple of substrate units arranged into an array. A pair of artificial microstructures is attached to each substrate. The pair of artificial microstructures includes a first artificial microstructure and a second artificial microstructure with different shapes. The dielectric constant of artificial electromagnetic materials gradually increases from zero in a certain frequency range, therefore the material has a low dielectric constant in the certain frequency range and can meet some needs of special situation.
Public/Granted literature
- US20130154902A1 ARTIFICIAL ELECTROMAGNETIC MATERIAL Public/Granted day:2013-06-20
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