发明授权
- 专利标题: Electroplating systems and methods for high sheet resistance substrates
- 专利标题(中): 高电阻基板的电镀系统和方法
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申请号: US13603836申请日: 2012-09-05
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公开(公告)号: US09222195B2公开(公告)日: 2015-12-29
- 发明人: Paul R. McHugh , Gregory J. Wilson
- 申请人: Paul R. McHugh , Gregory J. Wilson
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED Materials, Inc.
- 当前专利权人: APPLIED Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Perkins Coie LLP
- 代理商 Kenneth H. Ohriner
- 主分类号: C25D21/12
- IPC分类号: C25D21/12 ; C25D17/00 ; C25D7/12
摘要:
In an electroplating process, electric current is applied to two or more electrodes, with the current varying over time according to a multi-variable function. The multi-variable current function is integrated over time, for each electrode, to determine a net plating charge delivered. A plating profile of a plated-on layer of material is compared to a target plating profile. Deviations between the actual plating profile and the target plating profile are identified and used to determine new net plating charges for each electrode. One or more variables of the multi-variable function is changed to provide a new multi-variable function. The new net plating charges are distributed according to the new multi-variable current function, and are used to electroplate a layer of material on a second substrate.
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