Invention Grant
- Patent Title: Dynamically adjustable semiconductor metrology system
- Patent Title (中): 动态可调半导体计量系统
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Application No.: US13661752Application Date: 2012-10-26
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Publication No.: US09228943B2Publication Date: 2016-01-05
- Inventor: David Y. Wang , Guorong Vera Zhuang , Johannes D. de Veer , Kevin Peterlinz , Shankar Krishnan
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01N21/55 ; G01N21/21

Abstract:
The present invention may include an illumination source, a detector, a selectably adjustable optical system including a dynamically adjustable illumination pupil of the illumination arm, a dynamically adjustable collection pupil of the collection arm, a dynamically adjustable illumination field stop of the illumination arm, a dynamically adjustable collection field stop of the collection arm, a sensor configured to measure one or more optical characteristics of one or more components of the optical system, and a control system configured to selectably dynamically adjust at least one of the illumination pupil, the collection pupil, the illumination field stop, the collection field stop, and a spectral radiance of the illumination source.
Public/Granted literature
- US20130114085A1 Dynamically Adjustable Semiconductor Metrology System Public/Granted day:2013-05-09
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