Invention Grant
- Patent Title: Drain select gate voltage management
- Patent Title (中): 漏极选择栅极电压管理
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Application No.: US14320068Application Date: 2014-06-30
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Publication No.: US09230666B2Publication Date: 2016-01-05
- Inventor: Akira Goda , Pranav Kalavade , Doyle Rivers
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: G11C7/00
- IPC: G11C7/00 ; G11C16/12 ; G11C16/04

Abstract:
Some embodiments include apparatus, systems, and methods that operate to apply a first value of a drain select gate voltage during a first portion of a programming time period associated with programming a plurality of memory cells, and to apply a second value of the drain select gate voltage different from the first value during a second, subsequent portion of the programming time period. The drain select gate voltage may be changed between groups of programming pulses in a single programming cycle. The first and second portions may be determined according to the number of applied programming pulses, the number of memory cells that have been completely programmed, and/or other conditions. Additional apparatus, systems, and methods are disclosed.
Public/Granted literature
- US20140313825A1 DRAIN SELECT GATE VOLTAGE MANAGEMENT Public/Granted day:2014-10-23
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