发明授权
- 专利标题： Interconnect crack arrestor structure and methods
- 专利标题（中）： 互连防爆器结构和方法
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申请号： US13370127申请日： 2012-02-09
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公开(公告)号： US09230932B2公开(公告)日： 2016-01-05
- 发明人: Chen-Hua Yu , Da-Yuan Shih
- 申请人： Chen-Hua Yu , Da-Yuan Shih
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Slater & Matsil, L.L.P.
- 主分类号： H01L23/544
- IPC分类号： H01L23/544 ; H01L23/48 ; H01L23/00
摘要：
A system and method for preventing cracks is provided. An embodiment comprises placing crack stoppers into a connection between a semiconductor die and a substrate. The crack stoppers may be in the shape of hollow or solid cylinders and may be placed so as to prevent any cracks from propagating through the crack stoppers.
公开/授权文献
- US20130207239A1 Interconnect Crack Arrestor Structure and Methods 公开/授权日：2013-08-15
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