Invention Grant
- Patent Title: Method and apparatus for setting profile
- Patent Title (中): 用于设置轮廓的方法和装置
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Application No.: US14292256Application Date: 2014-05-30
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Publication No.: US09232392B2Publication Date: 2016-01-05
- Inventor: Duckey Lee , Jungje Son
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: The Farrell Law Firm, P.C.
- Priority: KR10-2013-0061851 20130530
- Main IPC: H04M1/66
- IPC: H04M1/66 ; H04W12/04 ; H04W8/18 ; H04W12/02 ; H04W12/10

Abstract:
A method and apparatus for setting profiles are provided. The profile setting method Includes receiving, from a first terminal, a profile transfer request message that requests transfer of a first profile or portion thereof from a first secure element to a second secure element; sending, to the first terminal, a request message requesting the first profile or portion thereof; receiving, from the first terminal, the first profile or portion thereof; configuring a second profile using the received first profile or portion thereof; and sending, to a second terminal, the configured second profile.
Public/Granted literature
- US20140357229A1 METHOD AND APPARATUS FOR SETTING PROFILE Public/Granted day:2014-12-04
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