Invention Grant
- Patent Title: Method for manufacturing high quality graphene by heating carbon-based self-assembly monolayers
- Patent Title (中): 通过加热碳基自组装单层制造高质量石墨烯的方法
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Application No.: US14141544Application Date: 2013-12-27
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Publication No.: US09233851B2Publication Date: 2016-01-12
- Inventor: SeokWoo Jeon , JinWook Baek , JinSup Lee
- Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2013-0080847 20130710
- Main IPC: C01B31/04
- IPC: C01B31/04 ; C23C14/14 ; C23C16/06 ; H01B1/04 ; C23F1/14 ; C23C14/20 ; C23F1/16

Abstract:
The present invention relates to the method for manufacturing high quality graphene by heating carbon-based self-assembly monolayers, comprising the steps of: forming carbon source layers which are convertible into the graphene layer on the substrate; forming a metal catalyst layer on the carbon source layer; converting the carbon source layers into the graphene layer by heating the first part of the substrate using a local heating source, wherein the carbon source layers and the metal catalyst layers are formed; converting the carbon source layers into graphene by moving the local heating source and then heating the second part which is different from the first part; and removing the metal catalyst layer. The present invention also provides a substrate comprising a graphene layer manufactured by the above method and provides applications in semiconductor devices and electronic materials using the substrate.
Public/Granted literature
- US20150014600A1 METHOD FOR MANUFACTURING HIGH QUALITY GRAPHENE BY HEATING CARBON-BASED SELF-ASSEMBLY MONOLAYERS Public/Granted day:2015-01-15
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