发明授权
US09235664B2 Systems and methods for executing unified process-device-circuit simulation
有权
执行统一过程设备电路仿真的系统和方法
- 专利标题: Systems and methods for executing unified process-device-circuit simulation
- 专利标题(中): 执行统一过程设备电路仿真的系统和方法
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申请号: US12607206申请日: 2009-10-28
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公开(公告)号: US09235664B2公开(公告)日: 2016-01-12
- 发明人: Kyung Rok Kim , Kyu-Baik Chang , Young Kwan Park , Seung Chul Lee , Jin Kyu Park
- 申请人: Kyung Rok Kim , Kyu-Baik Chang , Young Kwan Park , Seung Chul Lee , Jin Kyu Park
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2008-0107223 20081030
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G06G7/62 ; G06F9/44 ; G06F13/10 ; G06F13/12 ; G06F11/34
摘要:
A unified simulation system is provided. The unified simulation system includes an input database storing input data comprising an input parameter and environment information, a unified simulator executing a unified process-device-circuit simulation of characteristics of a semiconductor apparatus based on the input data and at least one predetermined model and outputting a simulation result as output data, and an output database storing the output data. The unified simulator includes a process simulator simulating at least one process based on the input data and outputting process characteristic data, a device simulator simulating at least one device based on the process characteristic data and outputting device characteristic data, and a circuit simulator simulating a circuit comprising the at least one device. Accordingly, multiple devices can be simultaneously optimized for the optimization of circuit characteristics and an accurate specification at process and device levels can be provided.
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