Invention Grant
US09236500B2 Schottky barrier diode and method for manufacturing schottky barrier diode 有权
肖特基势垒二极管及制造肖特基势垒二极管的方法

Schottky barrier diode and method for manufacturing schottky barrier diode
Abstract:
A Schottky barrier diode and a method of manufacturing the Schottky barrier diode are provided. The diode includes an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate and having an upper surface, a lower surface, and an inclined surface that connects the upper surface and the lower surface. A p region is disposed on the inclined surface of the n− type epitaxial layer and a Schottky electrode is disposed on the upper surface of the n− type epitaxial layer and the p region. In addition, an ohmic electrode is disposed on a second surface of the n+ type silicon carbide substrate.
Information query
Patent Agency Ranking
0/0