Invention Grant
US09236500B2 Schottky barrier diode and method for manufacturing schottky barrier diode
有权
肖特基势垒二极管及制造肖特基势垒二极管的方法
- Patent Title: Schottky barrier diode and method for manufacturing schottky barrier diode
- Patent Title (中): 肖特基势垒二极管及制造肖特基势垒二极管的方法
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Application No.: US14143735Application Date: 2013-12-30
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Publication No.: US09236500B2Publication Date: 2016-01-12
- Inventor: Jong Seok Lee , Kyoung-Kook Hong , Dae Hwan Chun , Youngkyun Jung
- Applicant: Hyundai Motor Company
- Applicant Address: KR Seoul
- Assignee: Hyundai Motor Company
- Current Assignee: Hyundai Motor Company
- Current Assignee Address: KR Seoul
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Priority: KR10-2013-0108479 20130910
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/872 ; H01L29/66 ; H01L29/16

Abstract:
A Schottky barrier diode and a method of manufacturing the Schottky barrier diode are provided. The diode includes an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate and having an upper surface, a lower surface, and an inclined surface that connects the upper surface and the lower surface. A p region is disposed on the inclined surface of the n− type epitaxial layer and a Schottky electrode is disposed on the upper surface of the n− type epitaxial layer and the p region. In addition, an ohmic electrode is disposed on a second surface of the n+ type silicon carbide substrate.
Public/Granted literature
- US20150069412A1 SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING SCHOTTKY BARRIER DIODE Public/Granted day:2015-03-12
Information query
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