Invention Grant
- Patent Title: Apparatus and method for obtaining uniform light source
- Patent Title (中): 用于获得均匀光源的装置和方法
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Application No.: US13671335Application Date: 2012-11-07
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Publication No.: US09239147B2Publication Date: 2016-01-19
- Inventor: Chih-Pin Jen , Ming-Chang Yang , Sheng-Kuai Yang
- Applicant: OmniVision Technologies, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Omnivision Technologies, Inc.
- Current Assignee: Omnivision Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lathrop & Gage LLP
- Main IPC: B60Q1/26
- IPC: B60Q1/26 ; F21V14/00 ; H05B37/02

Abstract:
An apparatus and method for increasing uniformity in light from a light source at a plurality of targets of the light include a plurality of movable aperture elements, locatable between the light source and the targets, each aperture element defining an aperture through which the light passes from the light source to an associated one of the plurality of targets associated with the aperture element along a longitudinal axis of the aperture element. A holder movably holds the plurality of aperture elements, each of the plurality of aperture elements being movable within the holder along the longitudinal axis of the aperture element to change a feature of light incident on the target associated with the aperture element.
Public/Granted literature
- US20140125368A1 Apparatus And Method For Obtaining Uniform Light Source Public/Granted day:2014-05-08
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