Invention Grant
US09255170B2 Block copolymer, method of forming the same, and method of forming pattern
有权
嵌段共聚物,其形成方法和形成图案的方法
- Patent Title: Block copolymer, method of forming the same, and method of forming pattern
- Patent Title (中): 嵌段共聚物,其形成方法和形成图案的方法
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Application No.: US14086182Application Date: 2013-11-21
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Publication No.: US09255170B2Publication Date: 2016-02-09
- Inventor: Min Hyuck Kang , Su Mi Lee , Myung Im Kim , Tae Woo Kim , Seung-Won Park , Xie Lei , Na Na Kang , Bong-Jin Moon , Joona Bang , Sang Hoon Woo , Jin Yeong Lee , Hyun Jung Jung , June Huh
- Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION , Sogang University Research Foundation
- Applicant Address: KR KR KR
- Assignee: SAMSUNG DISPLAY CO., LTD.,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION,SOGANG UNIVERSITY RESEARCH FOUNDATION
- Current Assignee: SAMSUNG DISPLAY CO., LTD.,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION,SOGANG UNIVERSITY RESEARCH FOUNDATION
- Current Assignee Address: KR KR KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0003439 20130111
- Main IPC: C08F279/02
- IPC: C08F279/02 ; C08F277/00 ; C08F293/00 ; C08G61/08 ; C08F279/00 ; C08G63/00 ; C08F32/06

Abstract:
A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
Public/Granted literature
- US20140197132A1 BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN Public/Granted day:2014-07-17
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