发明授权
- 专利标题: Defect inspection method and device thereof
- 专利标题(中): 缺陷检查方法及其装置
-
申请号: US13521086申请日: 2011-02-09
-
公开(公告)号: US09255793B2公开(公告)日: 2016-02-09
- 发明人: Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
- 申请人: Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Baker Botts L.L.P.
- 优先权: JP2010-027702 20100210
- 国际申请: PCT/JP2011/052787 WO 20110209
- 国际公布: WO2011/099537 WO 20110818
- 主分类号: G01N21/55
- IPC分类号: G01N21/55 ; G06F19/00 ; G01B11/30 ; G01N21/956 ; H01L21/67
摘要:
A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
公开/授权文献
- US20120296576A1 DEFECT INSPECTION METHOD AND DEVICE THEREOF 公开/授权日:2012-11-22
信息查询