Invention Grant
US09257523B2 Avalanche diode having an enhanced defect concentration level and method of making the same
有权
具有增强的缺陷浓度水平的雪崩二极管及其制造方法
- Patent Title: Avalanche diode having an enhanced defect concentration level and method of making the same
- Patent Title (中): 具有增强的缺陷浓度水平的雪崩二极管及其制造方法
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Application No.: US14304701Application Date: 2014-06-13
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Publication No.: US09257523B2Publication Date: 2016-02-09
- Inventor: Jens Schneider , Kai Esmark , Martin Wendel
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/66 ; H01L27/02 ; H01L29/32 ; H01L29/861 ; H01L29/866 ; H01L29/73 ; H01L23/62

Abstract:
The invention relates to an avalanche diode that can be employed as an ESD protection device. An avalanche ignition region is formed at the p-n junction of the diode and includes an enhanced defect concentration level to provide rapid onset of avalanche current. The avalanche ignition region is preferably formed wider than the diode depletion zone, and is preferably created by placement, preferably by ion implantation, of an atomic specie different from that of the principal device structure. The doping concentration of the placed atomic specie should be sufficiently high to ensure substantially immediate onset of avalanche current when the diode breakdown voltage is exceeded. The new atomic specie preferably comprises argon or nitrogen, but other atomic species can be employed. However, other means of increasing a defect concentration level in the diode depletion zone, such as an altered annealing program, are also contemplated.
Public/Granted literature
- US20140291808A1 Avalanche Diode Having an Enhanced Defect Concentration Level and Method of Making the Same Public/Granted day:2014-10-02
Information query
IPC分类: