Invention Grant
- Patent Title: Reaction chamber arrangement and a method for forming a reaction chamber arrangement
- Patent Title (中): 反应室装置和形成反应室装置的方法
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Application No.: US13336023Application Date: 2011-12-23
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Publication No.: US09257724B2Publication Date: 2016-02-09
- Inventor: Klaus Elian
- Applicant: Klaus Elian
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01M10/42
- IPC: H01M10/42 ; H01M10/48

Abstract:
A reaction chamber arrangement is provided, the reaction chamber arrangement including a first chemical reaction chamber; a second chemical reaction chamber; an isolation member between the first chemical reaction chamber and the second chemical reaction chamber, wherein a first electrode is mounted on a first side of the isolation member, an exposed surface of the first electrode facing into the first chemical reaction chamber and wherein a second electrode is mounted on a second side of the isolation member, an exposed surface of the second electrode facing into the second chemical reaction chamber; and an electronic component configured to measure or control at least one of the first chemical reaction chamber and the second chemical reaction chamber, wherein the electronic component is arranged between and connected to the first electrode and the second electrode, and at least partially surrounded by an isolation material of the isolation member.
Public/Granted literature
- US20130164566A1 REACTION CHAMBER ARRANGEMENT AND A METHOD FOR FORMING A REACTION CHAMBER ARRANGEMENT Public/Granted day:2013-06-27
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