发明授权
US09263228B2 Integrated photoemission sources and scalable photoemission structures
有权
集成的光电子发射源和可扩展的光电子结构
- 专利标题: Integrated photoemission sources and scalable photoemission structures
- 专利标题(中): 集成的光电子发射源和可扩展的光电子结构
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申请号: US14202646申请日: 2014-03-10
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公开(公告)号: US09263228B2公开(公告)日: 2016-02-16
- 发明人: Ravi K. Bonam
- 申请人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 代理商 Daniel P. Morris, Esq.
- 主分类号: H01J37/073
- IPC分类号: H01J37/073 ; H01J1/34 ; H01J9/12 ; H01J37/317
摘要:
A scalable, integrated photoemitter device and method of manufacture using conventional CMOS manufacturing techniques. The photoemitter device has a first semiconductor substrate having a plurality of photonic sources formed on top in a first material layer, the plurality of photonic sources and the material layer forming a planar surface. A second substrate is bonded to the planar surface, the second substrate having a plurality of photoemitter structures formed on top in a second material layer, each photoemitter structure in alignment with a respective photonic source of the first substrate and configured to generate particle beams responsive to light from a respective light source. Additionally provided is a multi-level photoemitter of tapered design for implementation in the scalable, integrated photoemitter device. Conventional CMOS manufacturing techniques are also implemented to build the multi-level photoemitter of tapered design.
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