Invention Grant
US09263480B2 Method for fabricating array substrate of display using multiple photoresists 有权
使用多个光致抗蚀剂制造显示器阵列基板的方法

Method for fabricating array substrate of display using multiple photoresists
Abstract:
A fabricating method of an array substrate, an array substrate and a display device are provided. The array substrate includes a substrate; a plate electrode, a gate electrode, a gate line, a gate insulating film, semiconductor silicon islands, a source electrode, a drain electrode, a data line, a slit electrode formed on the substrate, and the substrate is also provided with a gate line through hole and a data line through hole. The gate electrode and the gate line include the first transparent conductive material and gate metal material stacked sequentially; the slit electrode is directly connected to the drain electrode; a second transparent conductive material is connected to the gate line through the gate line through hole; and connected to the data line through the data line through hole.
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