Invention Grant
US09263480B2 Method for fabricating array substrate of display using multiple photoresists
有权
使用多个光致抗蚀剂制造显示器阵列基板的方法
- Patent Title: Method for fabricating array substrate of display using multiple photoresists
- Patent Title (中): 使用多个光致抗蚀剂制造显示器阵列基板的方法
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Application No.: US14350892Application Date: 2013-08-07
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Publication No.: US09263480B2Publication Date: 2016-02-16
- Inventor: Wei Qin
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201310150826 20130426
- International Application: PCT/CN2013/081018 WO 20130807
- International Announcement: WO2014/173039 WO 20141030
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L27/12 ; G02F1/1362 ; G02F1/1343

Abstract:
A fabricating method of an array substrate, an array substrate and a display device are provided. The array substrate includes a substrate; a plate electrode, a gate electrode, a gate line, a gate insulating film, semiconductor silicon islands, a source electrode, a drain electrode, a data line, a slit electrode formed on the substrate, and the substrate is also provided with a gate line through hole and a data line through hole. The gate electrode and the gate line include the first transparent conductive material and gate metal material stacked sequentially; the slit electrode is directly connected to the drain electrode; a second transparent conductive material is connected to the gate line through the gate line through hole; and connected to the data line through the data line through hole.
Public/Granted literature
- US20150214247A1 METHOD FOR FABRICATING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE Public/Granted day:2015-07-30
Information query
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