发明授权
US09263649B2 Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation
有权
用于精细图案形成的分层产品和用于精细图案形成的分层产品的制造方法
- 专利标题： Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation
- 专利标题（中）： 用于精细图案形成的分层产品和用于精细图案形成的分层产品的制造方法
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申请号： US14004305申请日： 2012-06-18
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公开(公告)号： US09263649B2公开(公告)日： 2016-02-16
- 发明人: Jun Koike , Fujito Yamaguchi , Masatoshi Maeda , Shinji Arihisa
- 申请人： Jun Koike , Fujito Yamaguchi , Masatoshi Maeda , Shinji Arihisa , Masayoshi Arihisa
- 申请人地址： JP Tokyo
- 专利权人： ASAHI KASEI E-MATERIALS CORPORATION
- 当前专利权人： ASAHI KASEI E-MATERIALS CORPORATION
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2011-139692 20110623; JP2011-185504 20110829; JP2011-185505 20110829; JP2011-285597 20111227; JP2011-286453 20111227; JP2012-013466 20120125; JP2012-022267 20120203; JP2012-037957 20120223; JP2012-038273 20120224
- 国际申请： PCT/JP2012/065494 WO 20120618
- 国际公布： WO2012/176728 WO 20121227
- 主分类号： H01L33/20
- IPC分类号： H01L33/20 ; H01L33/58 ; H01L21/469 ; G03F7/00 ; B29C33/38 ; B29C33/42 ; H01L33/00 ; B29C33/40 ; B82Y10/00 ; B82Y40/00
摘要：
Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern (220) in a processing object (200) using a first mask layer (103) includes: a mold (101) having a concavo-convex structure (101a) on a surface; and a second mask layer (102) provided on the concavo-convex structure (101a), wherein in the second mask layer (102), a distance (lcc) and a height (h) of the concavo-convex structure (101a) satisfy Formula (1) 0
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