发明授权
US09269532B2 Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam
有权
带电粒子束写入装置,以及用于检测带电粒子束的剂量不均匀的方法
- 专利标题: Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam
- 专利标题(中): 带电粒子束写入装置,以及用于检测带电粒子束的剂量不均匀的方法
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申请号: US14709200申请日: 2015-05-11
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公开(公告)号: US09269532B2公开(公告)日: 2016-02-23
- 发明人: Hironori Mizoguchi , Hideo Inoue
- 申请人: NUFLARE TECHNOLOGY, INC.
- 申请人地址: JP Kanagawa
- 专利权人: NUFLARE TECHNOLOGY, INC.
- 当前专利权人: NUFLARE TECHNOLOGY, INC.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Patterson & Sheridan LLP.
- 优先权: JP2014-099012 20140512
- 主分类号: G21K5/04
- IPC分类号: G21K5/04 ; H01J37/244 ; H01J37/317
摘要:
A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.
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