发明授权
US09269532B2 Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam 有权
带电粒子束写入装置,以及用于检测带电粒子束的剂量不均匀的方法

Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam
摘要:
A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.
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