Invention Grant
- Patent Title: Vacuum arc vaporisation source and also a vacuum arc vaporisation chamber with a vacuum arc vaporisation source
- Patent Title (中): 真空电弧蒸发源以及具有真空电弧蒸发源的真空电弧蒸发室
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Application No.: US12595273Application Date: 2008-03-11
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Publication No.: US09269545B2Publication Date: 2016-02-23
- Inventor: Joerg Vetter
- Applicant: Joerg Vetter
- Applicant Address: CH Truebbach
- Assignee: OERLIKON SURFACE SOLUTIONS AG, TRUEBBACH
- Current Assignee: OERLIKON SURFACE SOLUTIONS AG, TRUEBBACH
- Current Assignee Address: CH Truebbach
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: EP07106345 20070417
- International Application: PCT/EP2008/052844 WO 20080311
- International Announcement: WO2008/125397 WO 20081023
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/32 ; H01J37/305

Abstract:
The invention relates to a vacuum arc source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporization material (31) as a cathode (32) for the production of an arc discharge on an vaporization surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporization surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporization surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporization surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporization chamber (10) with an arc vaporization source (1).
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