Invention Grant
- Patent Title: Photonic device and methods of formation
- Patent Title (中): 光子器件和形成方法
-
Application No.: US14176736Application Date: 2014-02-10
-
Publication No.: US09274272B2Publication Date: 2016-03-01
- Inventor: Gurtej Sandhu , Roy Meade
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: G02B6/10
- IPC: G02B6/10 ; G02B6/12 ; G02B6/13 ; B82Y20/00 ; G02B6/122

Abstract:
A photonic device and methods of formation that provide an area providing reduced optical coupling between a substrate and an inner core of the photonic device are described. The area is formed using holes in the inner core and an outer cladding. The holes may be filled with materials which provide a photonic crystal. Thus, the photonic device may function as a waveguide and as a photonic crystal.
Public/Granted literature
- US20140153867A1 PHOTONIC DEVICE AND METHODS OF FORMATION Public/Granted day:2014-06-05
Information query