Invention Grant
US09275839B2 Toroidal plasma chamber for high gas flow rate process 有权
环形等离子体室用于高气体流量过程

  • Patent Title: Toroidal plasma chamber for high gas flow rate process
  • Patent Title (中): 环形等离子体室用于高气体流量过程
  • Application No.: US12738314
    Application Date: 2007-10-19
  • Publication No.: US09275839B2
    Publication Date: 2016-03-01
  • Inventor: Xing ChenAndrew Cowe
  • Applicant: Xing ChenAndrew Cowe
  • Applicant Address: US MA Andover
  • Assignee: MKS Instruments, Inc.
  • Current Assignee: MKS Instruments, Inc.
  • Current Assignee Address: US MA Andover
  • Agency: Proskauer Rose LLP
  • International Application: PCT/US2007/081875 WO 20071019
  • International Announcement: WO2009/051597 WO 20090423
  • Main IPC: H01J37/32
  • IPC: H01J37/32
Toroidal plasma chamber for high gas flow rate process
Abstract:
A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
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