Invention Grant
- Patent Title: Toroidal plasma chamber for high gas flow rate process
- Patent Title (中): 环形等离子体室用于高气体流量过程
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Application No.: US12738314Application Date: 2007-10-19
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Publication No.: US09275839B2Publication Date: 2016-03-01
- Inventor: Xing Chen , Andrew Cowe
- Applicant: Xing Chen , Andrew Cowe
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Proskauer Rose LLP
- International Application: PCT/US2007/081875 WO 20071019
- International Announcement: WO2009/051597 WO 20090423
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
Public/Granted literature
- US20100206847A1 Toroidal plasma chamber for high gas flow rate process Public/Granted day:2010-08-19
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