Invention Grant
- Patent Title: Junction field effect transistor with vertical PN junction
- Patent Title (中): 具有垂直PN结的结型场效应晶体管
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Application No.: US14025984Application Date: 2013-09-13
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Publication No.: US09276135B2Publication Date: 2016-03-01
- Inventor: Ralf Siemieniec , Cedric Ouvrard
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/80
- IPC: H01L29/80 ; H01L29/808 ; H01L29/739 ; H01L29/08

Abstract:
An embodiment relates to a JFET with a channel region and a gate region forming a pn junction. Between a source region and a drain region in a semiconductor portion, the pn junction extends along a vertical direction perpendicular to a first surface of the semiconductor portion. The source, channel and drain regions have a first conductivity type and are arranged along the vertical direction. The gate region and a shielding region between the gate and drain regions have a second, complementary conductivity type. An auxiliary region separates the gate and shielding regions in the semiconductor portion.
Public/Granted literature
- US20150076568A1 Junction Field Effect Transistor with Vertical PN Junction Public/Granted day:2015-03-19
Information query
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