Invention Grant
US09279037B2 Alkaline soluble resin, process for preparing same, and photoresist composition containing same
有权
碱溶性树脂,其制备方法和含有它的光致抗蚀剂组合物
- Patent Title: Alkaline soluble resin, process for preparing same, and photoresist composition containing same
- Patent Title (中): 碱溶性树脂,其制备方法和含有它的光致抗蚀剂组合物
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Application No.: US14239552Application Date: 2013-07-26
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Publication No.: US09279037B2Publication Date: 2016-03-08
- Inventor: Xuelan Wang , Chen Tang , Shan Chang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201310116385 20130403
- International Application: PCT/CN2013/080171 WO 20130726
- International Announcement: WO2014/161251 WO 20141009
- Main IPC: C08G81/02
- IPC: C08G81/02 ; C08G65/00 ; G03F7/038 ; G03F7/028 ; G03F7/30 ; G03F7/033 ; G03F7/004 ; C08G65/34 ; C08F220/06 ; C08F220/18 ; C08F265/02 ; G03F7/027 ; C08F216/06 ; C08F8/14 ; C08F261/00 ; C08F222/10

Abstract:
An alkaline soluble resin, a process for preparing the same, and a photoresist composition containing the same. The alkaline soluble resin is a polyether chain-containing acrylate alkaline soluble resin. A photoresist composition comprising said alkaline soluble resin can reduce the slope angle of the film layer and prevent gaps which cause light leakage from forming in the junction between the colored film layer and the black matrix. Moreover, the coating and the rubbing effect of the orientation layer can be improved.
Public/Granted literature
- US20150152210A1 ALKALINE SOLUBLE RESIN, PROCESS FOR PREPARING SAME, AND PHOTORESIST COMPOSITION CONTAINING SAME Public/Granted day:2015-06-04
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