Invention Grant
US09280057B2 Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus 有权
对准测量系统,光刻设备和确定光刻设备中的对准的方法

Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus
Abstract:
An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
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