Invention Grant
- Patent Title: Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus
- Patent Title (中): 对准测量系统,光刻设备和确定光刻设备中的对准的方法
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Application No.: US14725023Application Date: 2015-05-29
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Publication No.: US09280057B2Publication Date: 2016-03-08
- Inventor: Franciscus Godefridus Casper Bijnen , David Deckers , Sami Musa
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; G01D5/34 ; G01B9/02 ; G01B11/27

Abstract:
An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
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