发明授权
- 专利标题: Multi-wafer pair anodic bonding apparatus and method
- 专利标题(中): 多晶圆对阳极接合装置及方法
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申请号: US13872632申请日: 2013-04-29
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公开(公告)号: US09287126B2公开(公告)日: 2016-03-15
- 发明人: Chien-Hua Chen , Kianush Naeli , Stephen R. Farrar
- 申请人: Hewlett-Packard Development Company, L.P.
- 申请人地址: US TX Houston
- 专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人地址: US TX Houston
- 代理机构: Rathe Lindenbaum LLP
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L23/00 ; C03C27/00
摘要:
An electric field concurrently anodically bonds together wafers of each of a plurality of independent wafer pairs.
公开/授权文献
- US20140322892A1 MULTI-WAFER PAIR ANODIC BONDING APPARATUS AND METHOD 公开/授权日:2014-10-30
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