Invention Grant
- Patent Title: Multi-wafer pair anodic bonding apparatus and method
- Patent Title (中): 多晶圆对阳极接合装置及方法
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Application No.: US13872632Application Date: 2013-04-29
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Publication No.: US09287126B2Publication Date: 2016-03-15
- Inventor: Chien-Hua Chen , Kianush Naeli , Stephen R. Farrar
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agency: Rathe Lindenbaum LLP
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L23/00 ; C03C27/00

Abstract:
An electric field concurrently anodically bonds together wafers of each of a plurality of independent wafer pairs.
Public/Granted literature
- US20140322892A1 MULTI-WAFER PAIR ANODIC BONDING APPARATUS AND METHOD Public/Granted day:2014-10-30
Information query
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