Invention Grant
US09287256B2 Semiconductor device including a separation region formed around a first circuit region
有权
半导体器件包括围绕第一电路区域形成的分离区域
- Patent Title: Semiconductor device including a separation region formed around a first circuit region
- Patent Title (中): 半导体器件包括围绕第一电路区域形成的分离区域
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Application No.: US14517657Application Date: 2014-10-17
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Publication No.: US09287256B2Publication Date: 2016-03-15
- Inventor: Yoshinori Kaya , Yasushi Nakahara , Azuma Araya , Ryo Kanda , Tomonobu Kurihara , Tetsu Toda
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2013-225360 20131030
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L27/06 ; H01L29/06 ; H01L29/78 ; H01L27/092 ; H01L29/10 ; H03K17/687

Abstract:
Provided is a semiconductor device including a substrate of a first conductivity type, a first circuit region, a separation region, a second circuit region, and a rectifying element. The rectifying element has a second conductivity type layer, a first high concentration second conductivity type region, a second high concentration second conductivity type region, an element isolation film, a first insulation layer, and a first conductive film. A first contact is coupled to the first high concentration second conductivity type region, and a second contact is coupled to the second high concentration second conductivity type region. A third contact is coupled to the first conductive film. The first contact, the second contact and the third contact are separated from each other.
Public/Granted literature
- US20150115342A1 Semiconductor Device Public/Granted day:2015-04-30
Information query
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