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US09287256B2 Semiconductor device including a separation region formed around a first circuit region 有权
半导体器件包括围绕第一电路区域形成的分离区域

Semiconductor device including a separation region formed around a first circuit region
Abstract:
Provided is a semiconductor device including a substrate of a first conductivity type, a first circuit region, a separation region, a second circuit region, and a rectifying element. The rectifying element has a second conductivity type layer, a first high concentration second conductivity type region, a second high concentration second conductivity type region, an element isolation film, a first insulation layer, and a first conductive film. A first contact is coupled to the first high concentration second conductivity type region, and a second contact is coupled to the second high concentration second conductivity type region. A third contact is coupled to the first conductive film. The first contact, the second contact and the third contact are separated from each other.
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