发明授权
- 专利标题: Semiconductor structure for electrostatic discharge protection
- 专利标题(中): 半导体结构用于静电放电保护
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申请号: US14512453申请日: 2014-10-12
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公开(公告)号: US09293424B2公开(公告)日: 2016-03-22
- 发明人: Chun-Chung Ko , Chih-Lun Wu , Shuo-Yen Lin
- 申请人: Advanced Analog Technology, Inc.
- 申请人地址: TW Taiyuan Hi-Tech Industrial Park, Zhubei, Hsinchu County
- 专利权人: Advanced Analog Technology, Inc.
- 当前专利权人: Advanced Analog Technology, Inc.
- 当前专利权人地址: TW Taiyuan Hi-Tech Industrial Park, Zhubei, Hsinchu County
- 代理商 Winston Hsu; Scott Margo
- 优先权: TW102147561A 20131220; TW103127374A 20140808
- 主分类号: H01L23/58
- IPC分类号: H01L23/58 ; H01L29/66 ; H01L23/60 ; H01L27/02
摘要:
A semiconductor structure is arranged on an integrated circuit, the integrated circuit includes a seal ring arranged at outer periphery of the integrated circuit, a metal ring arranged at an inner side of the seal ring and a power bus arranged at a side of the metal ring. The semiconductor structure includes a first P type electrode area, a second P type electrode area and a first N type electrode area. The first P type electrode area is formed at a position on a P well corresponding to the seal ring, and coupled to the seal ring. The second P type electrode area is formed at a position on the P well corresponding to the metal ring, and coupled to the metal ring. The first N type electrode area is formed at a position corresponding to the power bus, and coupled to the power bus.
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