发明授权
US09293479B2 Oxide semiconductor TFT array substrate and oxide semiconductor TFT display device
有权
氧化物半导体TFT阵列基板和氧化物半导体TFT显示装置
- 专利标题: Oxide semiconductor TFT array substrate and oxide semiconductor TFT display device
- 专利标题(中): 氧化物半导体TFT阵列基板和氧化物半导体TFT显示装置
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申请号: US14091054申请日: 2013-11-26
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公开(公告)号: US09293479B2公开(公告)日: 2016-03-22
- 发明人: Junhui Lou , Sitao Huo
- 申请人: Shanghai Tianma Micro-Electronics Co., Ltd. , Tianma Micro-Electronics Co., Ltd.
- 申请人地址: CN Shanghai CN Shenzhen
- 专利权人: Shanghai Tianma Micro-Electronics Co., Ltd.,Tianma Micro-Electronics Co., Ltd.
- 当前专利权人: Shanghai Tianma Micro-Electronics Co., Ltd.,Tianma Micro-Electronics Co., Ltd.
- 当前专利权人地址: CN Shanghai CN Shenzhen
- 代理机构: Alston & Bird LLP
- 优先权: CH201310254826 20130624
- 主分类号: H01L29/12
- IPC分类号: H01L29/12 ; H01L27/12
摘要:
A TFT array substrate is disclosed. The substrate includes a TFT having a gate insulation layer, and an active layer partly thereon. The TFT also has a first part of an etch barrier layer on the active layer, and a source and drain on the first part of the etch barrier layer. The substrate also includes a capacitance having a first electrode plate, a second part of the gate insulation layer on the first electrode plate, a second part of the etch barrier layer on the second part of the gate insulation layer, and a second electrode plate on the second part of the etch barrier layer. The second part of the etch barrier layer has a thickness less than the first part of the etch barrier layer, and/or there is no etch barrier layer between the second part of the gate insulation layer and the second electrode plate.
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