Invention Grant
US09296132B2 Method for texturing a substrate having a large surface area 有权
纹理化表面积大的基板的方法

Method for texturing a substrate having a large surface area
Abstract:
The invention relates: to a process for forming a texture on a substrate, comprising: depositing a deformable layer on the substrate; bringing this deformable layer into contact with the textured face of a daughter stamp; introducing the coated substrate and the daughter stamp into a pouch made of an impermeable material; introducing the pouch and its contents into a hermetic vessel; evacuating air from the vessel until a pressure at most equal to 0.5 bar is reached; sealing the pouch before reintroducing air into the vessel; introducing the sealed pouch and its contents into an autoclave; applying a pressure comprised between 0.5 and 8 bar and a temperature comprised between 25 and 400° C. for 15 minutes to a plurality of hours; opening the pouch; then separating the substrate and the daughter stamp; to a transparent assembly, comprising a glass substrate coated with a textured layer, obtained by this process; and to applications of this process to obtain a substrate intended to extract, guide or redirect light, or a superhydrophobic or superhydrophilic substrate.
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