Invention Grant
- Patent Title: Methods and apparatuses for patterned low emissivity panels
- Patent Title (中): 图案化低辐射面板的方法和装置
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Application No.: US13715528Application Date: 2012-12-14
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Publication No.: US09297938B2Publication Date: 2016-03-29
- Inventor: Minh Huu Le , Brent Boyce , Guowen Ding , Mohd Fadzli Anwar Hassan , Zhi-Wen Wen Sun
- Applicant: Intermolecular Inc.
- Applicant Address: US CA San Jose US MI Auburn Hills
- Assignee: Intermolecular, Inc.,Guardian Industries Corp.
- Current Assignee: Intermolecular, Inc.,Guardian Industries Corp.
- Current Assignee Address: US CA San Jose US MI Auburn Hills
- Main IPC: G02B5/20
- IPC: G02B5/20 ; F21V9/04
Abstract:
A method for making low emissivity panels, comprising forming a patterned layer on a transparent substrate. The patterned layers can offer different color schemes or different decorative appearance styles for the coated panels, or can offer gradable thermal efficiency through the patterned layers.
Public/Granted literature
- US20140168759A1 Methods and apparatuses for patterned low emissivity panels Public/Granted day:2014-06-19
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